naa a22 4500 510816479 CHVBK 20180411083510.0 cr unu---uuuuu 180411e20131201xx s 000 0 eng 10.1007/s11468-013-9570-6 doi (NATIONALLICENCE)springer-10.1007/s11468-013-9570-6 A Super Lens System for Demagnification Imaging Beyond the Diffraction Limit [Elektronische Daten] [Jianjie Dong, Juan Liu, Xingxing Zhao, Peng Liu, Jing Liu, Guoguo Kang, Jinghui Xie, Yongtian Wang] A super lens system is proposed to achieve subdiffraction limit demagnification imaging. The super lens system consists of a hyperlens with planar input and output surfaces, a metal superlens, and a plasmonic reflector. By employing the hyperlens to transform evanescent waves into propagating waves and employing the metal superlens and the plasmonic reflector to amplify evanescent waves, the super lens system can produce a subdiffraction limit image with relatively high electric field intensity. The reduction factor of the super lens system depends on the geometric parameters of the hyperlens. Simulation results show that an image with a half-pitch resolution of about one tenth the operating wavelength and a reduction factor of about 2.2 can be produced by the super lens system. The proposed super lens system has potential applications in nanolithography. Springer Science+Business Media New York, 2013 Subwavelength optical imaging nationallicence Surface plasmon nationallicence Superlens nationallicence Dong Jianjie School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Liu Juan School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Zhao Xingxing School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Liu Peng School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Liu Jing School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Kang Guoguo School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Xie Jinghui School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Wang Yongtian School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut Plasmonics Springer US; http://www.springer-ny.com 8/4(2013-12-01), 1543-1550 1557-1955 8:4<1543 2013 8 11468 https://doi.org/10.1007/s11468-013-9570-6 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11468-013-9570-6 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Dong Jianjie School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Liu Juan School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Zhao Xingxing School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Liu Peng School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Liu Jing School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Kang Guoguo School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Xie Jinghui School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 700 1- Wang Yongtian School of Optoelectronics, Beijing Institute of Technology, 100081, Beijing, China aut NATIONALLICENCE 773 0- Plasmonics Springer US; http://www.springer-ny.com 8/4(2013-12-01), 1543-1550 1557-1955 8:4<1543 2013 8 11468 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer