naa a22 4500 510817416 CHVBK 20180411083514.0 cr unu---uuuuu 180411e20130601xx s 000 0 eng 10.1007/s11468-013-9510-5 doi (NATIONALLICENCE)springer-10.1007/s11468-013-9510-5 Subwavelength Demagnification Imaging and Lithography Using Hyperlens with a Plasmonic Reflector Layer [Elektronische Daten] [Guowei Ren, Changtao Wang, Guangwei Yi, Xing Tao, Xiangang Luo] Unlike the case in magnification mode, it is found that hyperlens employed in demagnification and lithography manner encounters great degradation of imaging quality especially for high-resolution image features. This problem mainly arises from the transversal magnetic polarization feature of light which delivers reduced contrast of electronic components intensity profile at the imaging region. Hyperlens with plasmonic reflector layer is designed for subwavelength demagnification imaging and photolithography. Analytical equations and numerical simulations show amplification of reflected evanescent waves in photoresist sandwiched by hyperlens and plasmonic reflectors in cylindrical geometry. The image quality features including resolution, contrast, and intensity can be improved significantly. Also presented are the dependence and influence of geometry parameters on imaging quality. Numerical demonstrations are given with about 15nm half-pitch resolution imaging at illuminating wavelength of 365nm. Springer Science+Business Media New York, 2013 Multilayers nationallicence Subwavelength structures nationallicence Metamaterials nationallicence Plasmonics nationallicence Ren Guowei State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut Wang Changtao State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut Yi Guangwei State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut Tao Xing State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut Luo Xiangang State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut Plasmonics Springer US; http://www.springer-ny.com 8/2(2013-06-01), 1065-1072 1557-1955 8:2<1065 2013 8 11468 https://doi.org/10.1007/s11468-013-9510-5 text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11468-013-9510-5 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Ren Guowei State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut NATIONALLICENCE 700 1- Wang Changtao State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut NATIONALLICENCE 700 1- Yi Guangwei State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut NATIONALLICENCE 700 1- Tao Xing State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut NATIONALLICENCE 700 1- Luo Xiangang State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, 610209, Chengdu, China aut NATIONALLICENCE 773 0- Plasmonics Springer US; http://www.springer-ny.com 8/2(2013-06-01), 1065-1072 1557-1955 8:2<1065 2013 8 11468 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer