naa a22 4500 510817890 CHVBK 20180411083517.0 cr unu---uuuuu 180411e20130601xx s 000 0 eng 10.1007/s11468-012-9401-1 doi (NATIONALLICENCE)springer-10.1007/s11468-012-9401-1 Near-Field Optical Imaging of a Porous Au Film: Influences of Topographic Artifacts and Surface Plasmons [Elektronische Daten] [Yu-Hsuan Lin, Benjamin Händel, Hung Huang, Hsiang-An Chen, Yung-Fu Chen, Heh-Nan Lin, Din Tsai] In this work, near-field scanning optical microscopy is employed to study a porous Au film and the direct observation of topographic artifacts and surface plasmon influences is revealed. Under tip illumination, topographic artifacts are found to be present in a reflection mode optical image but not in a transmission mode image. A simple algorithm is used for filtering the topographic artifacts and extracting a correct near-field optical image approximately. On the other hand, surface plasmon influences are present in both modes. By using three exciting wavelengths of 488, 647.1, and 520.8nm, it is confirmed that a suitable wavelength should be chosen for avoiding the surface plasmon interference in a near-field optical investigation of morphological or material dielectric contrast. Finally, plasmonic or nonplasmonic regions on the porous Au film can be identified from the observed optical intensity variation in the optical images obtained at incident polarizations of 0°, 90°, and 45°. Springer Science+Business Media, LLC, 2012 Near-field scanning optical microscopy nationallicence Porous gold film nationallicence Topographic artifact nationallicence Surface plasmon nationallicence Lin Yu-Hsuan Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut Händel Benjamin Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut Huang Hung Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut Chen Hsiang-An Department of Materials Science and Engineering, National Tsing Hua University, 30013, Hsinchu, Taiwan aut Chen Yung-Fu Department of Electrophysics, National Chiao Tung University, 30010, Hsinchu, Taiwan aut Lin Heh-Nan Department of Materials Science and Engineering, National Tsing Hua University, 30013, Hsinchu, Taiwan aut Tsai Din Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut Plasmonics Springer US; http://www.springer-ny.com 8/2(2013-06-01), 377-383 1557-1955 8:2<377 2013 8 11468 https://doi.org/10.1007/s11468-012-9401-1 text/html Onlinezugriff via DOI 1 brief-communication jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11468-012-9401-1 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Lin Yu-Hsuan Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Händel Benjamin Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Huang Hung Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Chen Hsiang-An Department of Materials Science and Engineering, National Tsing Hua University, 30013, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Chen Yung-Fu Department of Electrophysics, National Chiao Tung University, 30010, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Lin Heh-Nan Department of Materials Science and Engineering, National Tsing Hua University, 30013, Hsinchu, Taiwan aut NATIONALLICENCE 700 1- Tsai Din Instrument Technology Research Center, National Applied Research Laboratories, 30076, Hsinchu, Taiwan aut NATIONALLICENCE 773 0- Plasmonics Springer US; http://www.springer-ny.com 8/2(2013-06-01), 377-383 1557-1955 8:2<377 2013 8 11468 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer