naa a22 4500 510819761 CHVBK 20180411083525.0 cr unu---uuuuu 180411e20130701xx s 000 0 eng 10.1007/s11814-013-0075-y doi (NATIONALLICENCE)springer-10.1007/s11814-013-0075-y Hydrophobic properties of films grown by torch-type atmospheric pressure plasma in Ar ambient containing C6 hydrocarbon precursor [Elektronische Daten] [Hyang Son, Jae Park, Won Lee] The direct deposition of polymeric films with a torch-type atmospheric pressure plasma using benzene, n-hexane and cyclohexane in Ar was performed on several substrates. The surface morphologies of the films deposited with n-hexane and cyclohexane were uniformly smooth for all deposition thicknesses, and the typical water contact angle on the films indicating the degree of hydrophobicity was about 85o. However, the films deposited using benzene had a micro-coarse surface morphology and showed a superhydrophobic property with a water contact angle exceeding 150°. Some trace of oxygen incorporation was shown in all films due to the plasma deposition process in an air ambient. The small amount of oxygenated species did not lead to a decrease of hydrophobicity of the films. Korean Institute of Chemical Engineers, Seoul, Korea, 2013 Atmospheric Pressure Plasma nationallicence Surface Treatment nationallicence Hydrophobicity nationallicence Contact Angle nationallicence C6 Hydrocarbon nationallicence Son Hyang Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut Park Jae Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut Lee Won Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut Korean Journal of Chemical Engineering Springer US; http://www.springer-ny.com 30/7(2013-07-01), 1480-1484 0256-1115 30:7<1480 2013 30 11814 https://doi.org/10.1007/s11814-013-0075-y text/html Onlinezugriff via DOI 1 research-article jats NATIONALLICENCE 856 40 https://doi.org/10.1007/s11814-013-0075-y text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Son Hyang Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut NATIONALLICENCE 700 1- Park Jae Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut NATIONALLICENCE 700 1- Lee Won Department of Chemical Engineering, Kangwon National University, 200-701, Chuncheon-si, Gangwon-do, Korea aut NATIONALLICENCE 773 0- Korean Journal of Chemical Engineering Springer US; http://www.springer-ny.com 30/7(2013-07-01), 1480-1484 0256-1115 30:7<1480 2013 30 11814 Metadata rights reserved Springer special CC-BY-NC licence nationallicence BK010053 XK010053 XK010000 NATIONALLICENCE NATIONALLICENCE NL-springer