SiGe/Si epitaxy and wafer bonding applied to X-ray detectors
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| 008 | 180926s2018 sz a m 00 0deng d | ||
| 024 | 7 | |a urn:nbn:ch:bel-1613834 |2 urn | |
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| 040 | |a Sz |b ger |e rda | ||
| 041 | 0 | |a eng |b eng |b ger | |
| 082 | 7 | 4 | |a 530 |2 23sdnb |
| 082 | 7 | 4 | |a 621.3 |2 23sdnb |
| 100 | 1 | |a Jung |D Arik Sebastian |d 1990- |0 (DE-588)1163962260 |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a SiGe/Si epitaxy and wafer bonding applied to X-ray detectors |c presented by Arik Sebastian Jung |
| 264 | 1 | |a Zurich |c 2018 | |
| 300 | |a VI, 93 Seiten |b Illustrationen |c 21 cm | ||
| 502 | |b Dissertation |o No. 25044 |c ETH Zurich, |d 2018 | ||
| 504 | |a Literaturverzeichnis | ||
| 516 | |a application/pdf | ||
| 546 | |a Englischer Text mit englischer und deutscher Zusammenfassung | ||
| 650 | 7 | |a EPITAXIALSCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN) |x ger |0 (ETHUDK)000015688 |2 ethudk | |
| 650 | 7 | |a MESSTECHNISCHE SONDEN, SENSOREN, DETEKTOREN (PHYSIK) |x ger |0 (ETHUDK)000014246 |2 ethudk | |
| 650 | 7 | |a RÖNTGENSTRAHLEN (OPTIK) |x ger |0 (ETHUDK)000014791 |2 ethudk | |
| 650 | 7 | |a SILICIUM-GERMANIUM-VERBINDUNGEN (ANORGANISCHE CHEMIE) |x ger |0 (ETHUDK)000037099 |2 ethudk | |
| 650 | 7 | |a WAFER (MIKROELEKTRONIK) |x ger |0 (ETHUDK)000028650 |2 ethudk | |
| 655 | 7 | |a Hochschulschrift |0 (DE-588)4113937-9 |2 gnd-content | |
| 655 | 7 | |a Hochschulschrift |2 gnd-content | |
| 691 | 7 | |a sb |b 2018/21 |c 530 |k zh |2 snl-sb | |
| 691 | 7 | |a xehelv |b xediss |c 2020 |d 621.3 |2 snl ehelv | |
| 691 | 7 | |B u |a RÖNTGENSTRAHLEN (OPTIK) |z ger |u 535-34 |2 nebis E1 | |
| 691 | 7 | |B u |a MESSTECHNISCHE SONDEN, SENSOREN, DETEKTOREN (PHYSIK) |z ger |u 53.084.2 |2 nebis E1 | |
| 691 | 7 | |B u |a WAFER (MIKROELEKTRONIK) |z ger |u 621.3.049.771,22 |2 nebis E1 | |
| 691 | 7 | |B u |a EPITAXIALSCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN) |z ger |u 539.234 |2 nebis E1 | |
| 691 | 7 | |B u |a SILICIUM-GERMANIUM-VERBINDUNGEN (ANORGANISCHE CHEMIE) |z ger |u 546.28'289 |2 nebis E1 | |
| 691 | 7 | |B u |a X-RAYS (OPTICS) |z eng |u 535-34 |2 nebis E1 | |
| 691 | 7 | |B u |a RAYONS X (OPTIQUE) |z fre |u 535-34 |2 nebis E1 | |
| 691 | 7 | |B u |a MEASURING DEVICES, SENSORS, DETECTORS (PHYSICS) |z eng |u 53.084.2 |2 nebis E1 | |
| 691 | 7 | |B u |a CAPTEURS, SENSEURS, DÉTECTEURS (PHYSIQUE) |z fre |u 53.084.2 |2 nebis E1 | |
| 691 | 7 | |B u |a WAFER (MICROELECTRONICS) |z eng |u 621.3.049.771,22 |2 nebis E1 | |
| 691 | 7 | |B u |a WAFER (MICROÉLECTRONIQUE) |z fre |u 621.3.049.771,22 |2 nebis E1 | |
| 691 | 7 | |B u |a THIN LAYER FORMATION BY VAPORIZATION AND CONDENSATION (PHYSICS OF MOLECULAR SYSTEMS) |z eng |u 539.234 |2 nebis E1 | |
| 691 | 7 | |B u |a COUCHES ÉPITAXIALES (PHYSIQUE DES SYSTÈMES MOLÉCULAIRES) |z fre |u 539.234 |2 nebis E1 | |
| 691 | 7 | |B u |a SILICIUM-GERMANIUM/COMPOSÉS (CHIMIE INORGANIQUE) |z fre |u 546.28'289 |2 nebis E1 | |
| 691 | 7 | |B u |a SILICON-GERMANIUM COMPOUNDS (INORGANIC CHEMISTRY) |z eng |u 546.28'289 |2 nebis E1 | |
| 710 | 2 | |a Eidgenössische Technische Hochschule Zürich |0 (DE-588)2023928-2 |e Grad-verleihende Institution |4 dgg | |
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| 949 | |B NEBIS |F E16 |b E16 |c RH |j Diss ETH 25044 | ||
| 950 | |B SNL |P 100 |E 1- |a Jung |D Arik Sebastian |d 1990- |0 (DE-588)1163962260 |e Verfasser |4 aut | ||
| 950 | |B SNL |P 856 |E 41 |u https://opac.admin.ch/toc/toc1902038569.pdf |y Inhaltsverzeichnis | ||
| 950 | |B SNL |P 710 |E 2- |a Eidgenössische Technische Hochschule Zürich |0 (DE-588)2023928-2 |e Grad-verleihende Institution |4 dgg | ||
| 950 | |B SNL |P 100 |E 1- |a Jung |D Arik S. |e Verfasser |4 aut | ||
| 950 | |B SNL |P 856 |E 40 |u http://hdl.handle.net/20.500.11850/275347 | ||
| 950 | |B SNL |P 856 |E 4- |u https://nbn-resolving.org/urn:nbn:ch:bel-1613834 | ||
| 950 | |B SNL |P 856 |E 42 |u http://www.e-helvetica.nb.admin.ch/directAccess?callnumber=bel-1613834 | ||
| 950 | |B NEBIS |P 100 |E 1- |a Jung |D Arik Sebastian |d 1990- |0 (DE-588)1163962260 |e Verfasser |4 aut | ||
| 950 | |B NEBIS |P 700 |E 1- |a Bona |D Gian-Luca |d 1957- |0 (DE-588)1089592310 |e Akademischer Betreuer |4 dgs | ||
| 950 | |B NEBIS |P 700 |E 1- |a Schröder |D Thomas |e Akademischer Betreuer |4 dgs | ||