Effect of the Formation of Silicon Oxide on the Sign, Magnitude and Formation of Surface Charge Upon Water Adsorption on a Silicon Surface

Verfasser / Beitragende:
[V. Gromashevskii, N. Tatyanenko, B. Snopok]
Ort, Verlag, Jahr:
2015
Enthalten in:
Theoretical and Experimental Chemistry, 51/3(2015-07-01), 170-176
Format:
Artikel (online)
ID: 605451338
LEADER caa a22 4500
001 605451338
003 CHVBK
005 20210128100151.0
007 cr unu---uuuuu
008 210128e20150701xx s 000 0 eng
024 7 0 |a 10.1007/s11237-015-9412-z  |2 doi 
035 |a (NATIONALLICENCE)springer-10.1007/s11237-015-9412-z 
245 0 0 |a Effect of the Formation of Silicon Oxide on the Sign, Magnitude and Formation of Surface Charge Upon Water Adsorption on a Silicon Surface  |h [Elektronische Daten]  |c [V. Gromashevskii, N. Tatyanenko, B. Snopok] 
520 3 |a The adsorption of water vapor on the Si(100) surface was found to proceed with formation of a charged form of an adsorption complex using the transverse acoustoelectric effect in the layered piezodielectric/air-gap/semiconductor structure. The sign of the localized surface charge is a function of the formation of silicon oxide and changes from positive to negative in going from the crystalline silicon(100) surface to the oxide-coated surface. Discrete states of the surface charge were observed. 
540 |a Springer Science+Business Media New York, 2015 
690 7 |a adsorption  |2 nationallicence 
690 7 |a surface charge  |2 nationallicence 
690 7 |a water  |2 nationallicence 
690 7 |a silicon  |2 nationallicence 
690 7 |a transverse acoustoelectric effect  |2 nationallicence 
700 1 |a Gromashevskii  |D V.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
700 1 |a Tatyanenko  |D N.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
700 1 |a Snopok  |D B.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
773 0 |t Theoretical and Experimental Chemistry  |d Springer US; http://www.springer-ny.com  |g 51/3(2015-07-01), 170-176  |x 0040-5760  |q 51:3<170  |1 2015  |2 51  |o 11237 
856 4 0 |u https://doi.org/10.1007/s11237-015-9412-z  |q text/html  |z Onlinezugriff via DOI 
898 |a BK010053  |b XK010053  |c XK010000 
900 7 |a Metadata rights reserved  |b Springer special CC-BY-NC licence  |2 nationallicence 
908 |D 1  |a research-article  |2 jats 
949 |B NATIONALLICENCE  |F NATIONALLICENCE  |b NL-springer 
950 |B NATIONALLICENCE  |P 856  |E 40  |u https://doi.org/10.1007/s11237-015-9412-z  |q text/html  |z Onlinezugriff via DOI 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Gromashevskii  |D V.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Tatyanenko  |D N.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Snopok  |D B.  |u V. E. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospekt Nauky, 41, 03028, Kyiv, Ukraine  |4 aut 
950 |B NATIONALLICENCE  |P 773  |E 0-  |t Theoretical and Experimental Chemistry  |d Springer US; http://www.springer-ny.com  |g 51/3(2015-07-01), 170-176  |x 0040-5760  |q 51:3<170  |1 2015  |2 51  |o 11237