A density functional theory study of CO oxidation on CuO1-x(111)

Verfasser / Beitragende:
[Bing-Xing Yang, Li-Ping Ye, Hui-Jie Gu, Jin-Hua Huang, Hui-Ying Li, Yong Luo]
Ort, Verlag, Jahr:
2015
Enthalten in:
Journal of Molecular Modeling, 21/8(2015-08-01), 1-7
Format:
Artikel (online)
ID: 605513031
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024 7 0 |a 10.1007/s00894-015-2726-x  |2 doi 
035 |a (NATIONALLICENCE)springer-10.1007/s00894-015-2726-x 
245 0 2 |a A density functional theory study of CO oxidation on CuO1-x(111)  |h [Elektronische Daten]  |c [Bing-Xing Yang, Li-Ping Ye, Hui-Jie Gu, Jin-Hua Huang, Hui-Ying Li, Yong Luo] 
520 3 |a The surface structures, CO adsorption, and oxidation-reaction properties of CuO1-x(111) with different reduction degree have been investigated by using density functional theory including on-site Coulomb corrections (DFT + U). Results indicate that the reduction of Cu has a great influence on the adsorption of CO. Electron localization caused by the reduction turns Cu2+ to Cu+, which interacts much stronger with CO, and the adsorption strength of CO is related to the electronic interaction with the substrate as well as the structural relaxation. In particular, the electronic interaction is proved to be the decisive factor. The surfaces of CuO1-x(111) with different reduction degree all have good adsorption to CO. With the expansion of the surface reduction degree, the amount of CO that is stably adsorbed on the surface increases, while the number of surface active lattice O decreases. In general, the activity of CO oxidation first rises and then declines. 
540 |a Springer-Verlag Berlin Heidelberg, 2015 
690 7 |a CO adsorption  |2 nationallicence 
690 7 |a CuO  |2 nationallicence 
690 7 |a DFT  |2 nationallicence 
690 7 |a Surface reduction  |2 nationallicence 
700 1 |a Yang  |D Bing-Xing  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
700 1 |a Ye  |D Li-Ping  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
700 1 |a Gu  |D Hui-Jie  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
700 1 |a Huang  |D Jin-Hua  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
700 1 |a Li  |D Hui-Ying  |u Shanghai Institute of Technology, 200235, Shanghai, People's Republic of China  |4 aut 
700 1 |a Luo  |D Yong  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
773 0 |t Journal of Molecular Modeling  |d Springer Berlin Heidelberg  |g 21/8(2015-08-01), 1-7  |x 1610-2940  |q 21:8<1  |1 2015  |2 21  |o 894 
856 4 0 |u https://doi.org/10.1007/s00894-015-2726-x  |q text/html  |z Onlinezugriff via DOI 
898 |a BK010053  |b XK010053  |c XK010000 
900 7 |a Metadata rights reserved  |b Springer special CC-BY-NC licence  |2 nationallicence 
908 |D 1  |a research-article  |2 jats 
949 |B NATIONALLICENCE  |F NATIONALLICENCE  |b NL-springer 
950 |B NATIONALLICENCE  |P 856  |E 40  |u https://doi.org/10.1007/s00894-015-2726-x  |q text/html  |z Onlinezugriff via DOI 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Yang  |D Bing-Xing  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Ye  |D Li-Ping  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Gu  |D Hui-Jie  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Huang  |D Jin-Hua  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Li  |D Hui-Ying  |u Shanghai Institute of Technology, 200235, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 700  |E 1-  |a Luo  |D Yong  |u Shanghai Research Institute of Chemical Industry, 200062, Shanghai, People's Republic of China  |4 aut 
950 |B NATIONALLICENCE  |P 773  |E 0-  |t Journal of Molecular Modeling  |d Springer Berlin Heidelberg  |g 21/8(2015-08-01), 1-7  |x 1610-2940  |q 21:8<1  |1 2015  |2 21  |o 894