caa a22 4500 606194983 CHVBK 20210128100917.0 cr unu---uuuuu 210128e20151201xx s 000 0 eng 10.1007/s10934-015-0023-9 doi (NATIONALLICENCE)springer-10.1007/s10934-015-0023-9 A template-based method for preparing ordered porous silicon [Elektronische Daten] [Xing Wang, Ying Wu, Xiaowei Liu, Jianyong Chen, Congmian Zhen, Li Ma, Denglu Hou] A detailed study of a new method for preparing ordered porous silicon (PS) is reported. An Ag@SiO2 two-dimensional template was caused to self-assemble on a silicon surface using the vertical deposition method. Ordered PS was obtained by electrodeless etching of the Si wafer plus template in a mixed solution of HF and H2O2. The ordered PS was characterized using Field Emission Scanning Electron Microscopy, Spectrofluorimetry and Fourier Transform Infrared Absorption Spectroscopy. The diameter of the nanopores is about 500nm. And the thermal conductivities of the ordered PS were found to be reduced compared to bulk silicon and disordered PS, due to enhanced phonon scattering. Compared with disordered PS, the ordered PS has a lower specific surface area. Straight holes and columnar structure in the ordered PS result in high absorption when the wavelength is longer than 890nm and a high transmittance in the test range of 400-4000 wavenumbers. Springer Science+Business Media New York, 2015 Ordered porous silicon nationallicence Ag@SiO2 two-dimensional template nationallicence Phonon scattering nationallicence Thermal conductivities nationallicence Wang Xing Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Wu Ying Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Liu Xiaowei Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Chen Jianyong Guilin University of Aerospace Technology, Guilin, China aut Zhen Congmian Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Ma Li Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Hou Denglu Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut Journal of Porous Materials Springer US; http://www.springer-ny.com 22/6(2015-12-01), 1431-1435 1380-2224 22:6<1431 2015 22 10934 https://doi.org/10.1007/s10934-015-0023-9 text/html Onlinezugriff via DOI BK010053 XK010053 XK010000 Metadata rights reserved Springer special CC-BY-NC licence nationallicence 1 research-article jats NATIONALLICENCE NATIONALLICENCE NL-springer NATIONALLICENCE 856 40 https://doi.org/10.1007/s10934-015-0023-9 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Wang Xing Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 700 1- Wu Ying Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 700 1- Liu Xiaowei Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 700 1- Chen Jianyong Guilin University of Aerospace Technology, Guilin, China aut NATIONALLICENCE 700 1- Zhen Congmian Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 700 1- Ma Li Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 700 1- Hou Denglu Hebei Advanced Thin Films Laboratory, Department of Physics, Hebei Normal University, 050024, Shijiazhuang, China aut NATIONALLICENCE 773 0- Journal of Porous Materials Springer US; http://www.springer-ny.com 22/6(2015-12-01), 1431-1435 1380-2224 22:6<1431 2015 22 10934