caa a22 4500 606244107 CHVBK 20210128101328.0 cr unu---uuuuu 210128e20151201xx s 000 0 eng 10.1007/s12596-015-0272-7 doi (NATIONALLICENCE)springer-10.1007/s12596-015-0272-7 Analysis of surface quality and processing optimization of magnetorheological polishing of KDP crystal [Elektronische Daten] [Shaoshan Chen, Shengyi Li, Hao Hu, Guipeng Tie, Chaoliang Guan, Qi Li] A new non-aqueous and abrasive-free magnetorheological (MRF) polishing method is adopted for processing KDP crystal due to its low hardness, high brittleness, temperature sensitivity, and water solubility. Water content in magnetorheological fluids has an important effect on polishing surface quality. In addition to affecting the removal efficiency and fogging, the recrystallization of KDP can produce great influence on surface quality. This paper analyzes the formation of recrystallization process, chemical composition, influence factors and finds a method to restrain recrystallization. Results indicate the surface roughness of KDP crystal by MRF is 0.624nm (Ra), 0.809nm (RMS). We get neat, non-nick and ultra smooth surface after MRF polishing. Besides the improvement of surface roughness, the tool marks imported by single-point diamond turning (SPDT) are eliminated clearly. This has significant meaning on KDP crystal processing. Large size KDP crystal is widely used in high power laser system. The cutting tool marks will affect the laser induced damage threshold (LIDT) clearly. This means after MRF polishing the KDP crystal has better performance in high power laser system without recrystallization, obvious scratch, and tool marks. The Optical Society of India, 2015 KDP crystal nationallicence Non-aqueous magnetorheological nationallicence Water content nationallicence Recrystallization nationallicence Surface roughness nationallicence Chen Shaoshan College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Li Shengyi College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Hu Hao College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Tie Guipeng College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Guan Chaoliang College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Li Qi College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut Journal of Optics Springer India 44/4(2015-12-01), 384-390 0972-8821 44:4<384 2015 44 12596 https://doi.org/10.1007/s12596-015-0272-7 text/html Onlinezugriff via DOI BK010053 XK010053 XK010000 Metadata rights reserved Springer special CC-BY-NC licence nationallicence 1 research-article jats NATIONALLICENCE NATIONALLICENCE NL-springer NATIONALLICENCE 856 40 https://doi.org/10.1007/s12596-015-0272-7 text/html Onlinezugriff via DOI NATIONALLICENCE 700 1- Chen Shaoshan College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 700 1- Li Shengyi College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 700 1- Hu Hao College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 700 1- Tie Guipeng College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 700 1- Guan Chaoliang College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 700 1- Li Qi College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha, China aut NATIONALLICENCE 773 0- Journal of Optics Springer India 44/4(2015-12-01), 384-390 0972-8821 44:4<384 2015 44 12596