Preferred orientations of NiO thin films prepared by RF magnetron sputtering

Authors / Contributors:
[H. Ryu, G. Choi, W. Lee, J. Park]
Place, publisher, year:
2004
Contained in:
Journal of Materials Science, 39/13(2004-07-01), 4375-4377
Format:
Article (online)
ID: 466343345